Chemical Engineering student Cinzu Czenn in the UH Department of Chemical Engineering is using a Tesla Coil to initiate a gaseous discharge in a parallel-plate plasma reactor, similar to ones used in the semiconductor industry to etch fine features in silicon integrated circuits. In this laboratory, which is operated under the supervision of Chemical Engineering Professor Vincent Donnelly, students and postdocs carry out experiments to understand the chemistry and physics underlying the plasma etching process. In this particular experiment, Czenn is determining the effects of different major carrier gases on the density and energy of electrons in the plasma. She uses the light emitted by the plasma to determine these and other properties. Such measurements can be used to establish the best conditions for etching that will cause the least amount of damage to integrated circuits. Photo by Jeff Shaw.
Name: Cinzu Czenn
Major: Chemical Engineering
How long have you been at UH? My first semester was last Fall (Fall 2002).
Where did you grow up? Taiwan. I first came here to study English in January 2000, then decided to pursue more knowledge in a professional field.
Plans after graduation: I believe the purpose for all kinds of Engineering is for improving human lives. I hope to have a good job which supports me so that I can devote myself to helping people to have a better life.
I'd like to stay here in the U.S. I am used to the environment here and also wish to give something back to the place that provided me the opportunity to professional study.