B. P. Craver, and J.C. Wolfe, "Neutral Particle Lithography: A Simple Solution to Charge Related Artefacts in Ion Beam Proximity Printing" Journal of Physics D, Vol. 41, 024007-024018, Jan. 2008 (Invited).

Bhargava, M., W. Donner, A. K. Srivastava, and J.C. Wolfe, "Bragg Diffraction, Synchrotron X-Ray Reflectance, and X-Ray Photoelectron Spectroscopy Studies of Low Temperature Plasma Oxidation of Native SiO2 on SOI" J. Vac. Sci. Technol. B, Vol. 26, 305-309, Jan. 2008.

Craver, Barry, Hatem Nounu, James Wasson, and J.C. Wolfe, "Neutral Particle Proximity Lithography: Non-Contact Nanoscale Printing without Charge-Related Artifacts" J. Vac. Sci. Technol. B, Vol. 26, 1866-1870, Nov. 2008.

Parikh, Dhara, Barry Craver, Hatem Nounu, Fu-on Fong, and J.C. Wolfe, "Nanoscale Pattern Definition on Non-Planar Surfaces using Ion Beam Proximity Lithography and Conformal, Plasma-Deposited Resist," Journ. Microelectromechanical Systems, Vol. 17, 735-740, June 2008.

Yao, Manwen, Ooi-Kiang Tan, Swee-Chuan Tjin, and J.C. Wolfe, "Effects of Intermediate Dielectric Films on Multilayer Surface Plasmon Resonance Behavior," Acta Biomaterialia, Vol. 4, 2016-27, Nov. 2008.

Yao, M. and J.C. Wolfe, "A Laser-induced Fluorescence Biosensor by Using Ellipsoidal Reflector," Optics and Laser Technology, 39, 1040-1045, 2007.

Craver, B., A. Roy, H. Nounu, and J.C. Wolfe, "Mechanical Nanostepping for Atom Beam Lithography," J. Vac. Sci. Technol. B, 25(6), 2192-2194, 2007.

Guo, H.-J., B. Craver, J. Reynolds, and J.C. Wolfe, "Design Studies for a High Brightness, Energetic Neutral Atom Source for Proximity Lithography," J. Vac. Sci. Technol. B, 25(6), 2188-2191, 2007.

V. Zomorrodian, B. Craver, G. Radhakrishnan, M. Patel, E. J. Charlson, P. Ruchhoeft and J.C. Wolfe, "Threshold voltage adjustment on spherical, single-crystal silicon substrates by focused ion beam implantation," J. Vac. Sci. Technol. B 24, 3221, 2006

V. Parekh, A. Ruiz, P. Ruchhoeft, H. Nounu, D. Litvinov and J.C. Wolfe, "Estimation of scattered particle exposure in ion beam aperture array lithography," J. Vac. Sci. Technol. B 24, 2915, 2006

V. Parekh, C. E, D. Smith, A. Ruiz, J.C. Wolfe, P. Ruchhoeft, E. Svedberg, S. Khizroev and D. Litvinov, "Fabrication of a High Anisotropy Nanoscale Patterned Magnetic Recording Medium For Data Storage Applications," Nanotechnology, 17, 2079, 2006

E. Chunsheng, D. Smith, S. Khizroev, D. Weller, J. Wolfe, and D. Litvinov, "Physics of Patterned Medium Recording: Design Considerations," Journal of Applied Physics, Vol. 98, No. 2, pp. 1-8, 2005.

J.C. Wolfe, S.V. Pendharkar, "Reactive ion etching of silicon stencil masks in the presence of an axial magnetic field,'' Journal Vac. Sci. Technology, Vol. B13, pp. 2588-2592, 1995.

J.C. Wolfe, A. Chalupka, H. Loschner, et. al., "Distortion analysis of stencil masks with internal stress-relief structures,'' Journal Vac. Sci. Technology, Vol. B13, pp. 2613-2617, 1995.

J.C. Wolfe, J. Wosik, L.M. Xie, et. al., "Flux quantization in weak links of YBCO bulk materials," Physical Review, Vol. 51, pp. 16289-16301, 1995.