Professor John Wolfe received his B.S. and PhD. in physics from the University of Rochester in 1967 and 1973 respectively. He joined the department in 1976 after holding post-doctoral fellowships at the University of British Columbia and the Katholieke Universiteit te Leuven in Belgium. Dr. Wolfe served as chairman of the ECE Department in 1996/97 where he was instrumental in establishing the M.E.E. program in Telecommunications. He began his current position as Interim Dean of the College of Engineering in 1997.

 
-• Research and Academics

Dr. Wolfe has developed a research laboratory in microfabrication. He has worked on high density electron beam addressed archival storage schemes with the goal of developing a library system providing access to the Library of Congress. His current areas of research are integrated circuit metallization, resist evaluation, ion beam lithography, and super-conducting thin films for microwave and high current applications.

 
-• Selected Publications

B. P. Craver, and J.C. Wolfe, “Neutral Particle Lithography: A Simple Solution to Charge Related Artefacts in Ion Beam Proximity Printing” Journal of Physics D, Vol. 41, 024007-024018, Jan. 2008 (Invited)..

Bhargava, M., W. Donner, A. K. Srivastava, and J.C. Wolfe, “Bragg Diffraction, Synchrotron X-Ray Reflectance, and X-Ray Photoelectron Spectroscopy Studies of Low Temperature Plasma Oxidation of Native SiO2 on SOI”J. Vac. Sci. Technol. B, Vol. 26, 305-309, Jan. 2008.

Craver, Barry, Hatem Nounu, James Wasson, and J.C. Wolfe, “Neutral Particle Proximity Lithography: Non-Contact Nanoscale Printing without Charge-Related Artifacts”J. Vac. Sci. Technol. B, Vol. 26, 1866-1870, Nov. 2008.

Parikh, Dhara, Barry Craver, Hatem Nounu, Fu-on Fong, and J.C. Wolfe, “Nanoscale Pattern Definition on Non-Planar Surfaces using Ion Beam Proximity Lithography and Conformal, Plasma-Deposited Resist,”Journ. Microelectromechanical Systems, Vol. 17, 735-740, June 2008.

Yao, Manwen, Ooi-Kiang Tan, Swee-Chuan Tjin, and J.C. Wolfe, “Effects of Intermediate Dielectric Films on Multilayer Surface Plasmon Resonance Behavior,”Acta Biomaterialia, Vol. 4, 2016-27, Nov. 2008.

Yao, M. and J.C. Wolfe, “A Laser-induced Fluorescence Biosensor by Using Ellipsoidal Reflector,” Optics and Laser
Technology, 39, 1040–1045, 2007.

Craver, B., A. Roy, H. Nounu, and J.C. Wolfe, “Mechanical Nanostepping for Atom Beam Lithography,” J. Vac. Sci. Technol. B, 25(6), 2192–2194, 2007.

Guo, H.-J., B. Craver, J. Reynolds, and J.C. Wolfe, “Design Studies for a High Brightness, Energetic Neutral Atom Source for Proximity Lithography,” J. Vac. Sci. Technol. B, 25(6), 2188–2191, 2007.

V. Zomorrodian, B. Craver, G. Radhakrishnan, M. Patel, E. J. Charlson, P. Ruchhoeft and J. C. Wolfe, “Threshold voltage adjustment on spherical, single-crystal silicon substrates by focused ion beam implantation,” J. Vac. Sci. Technol. B 24, 3221, 2006

V. Parekh, A. Ruiz, P. Ruchhoeft, H. Nounu, D. Litvinov and J. C. Wolfe, “Estimation of scattered particle exposure in ion beam aperture array lithography,” J. Vac. Sci. Technol. B 24, 2915, 2006

V. Parekh, C. E, D. Smith, A. Ruiz, J.C. Wolfe, P. Ruchhoeft, E. Svedberg, S. Khizroev and D. Litvinov, "Fabrication of a High Anisotropy Nanoscale Patterned Magnetic Recording Medium For Data Storage Applications," Nanotechnology, 17, 2079, 2006

E. Chunsheng, D. Smith, S. Khizroev, D. Weller, J. Wolfe, and D. Litvinov, “Physics of Patterned Medium Recording: Design Considerations,” Journal of Applied Physics, Vol. 98, No. 2, pp. 1–8, 2005.

J.C. Wolfe, S.V. Pendharkar, "Reactive ion etching of silicon stencil masks in the presence of an axial magnetic field,'' Journal Vac. Sci. Technology, Vol. B13, pp. 2588-2592, 1995.

J.C. Wolfe, A. Chalupka, H. Loschner, et. al., "Distortion analysis of stencil masks with internal stress-relief structures,'' Journal Vac. Sci. Technology, Vol. B13, pp. 2613-2617, 1995.

J.C. Wolfe, J. Wosik, L.M. Xie, et. al., "Flux quantization in weak links of YBCO bulk materials," Physical Review, Vol. 51, pp. 16289-16301, 1995.