Xu, L., A. Nasrullah, Z. Chen, M. Jain, D. J. Economou, and V. M. Donnelly, P. Ruchhoeft, "Etching of Nanopatterns in Silicon using Nanopantography,"Applied Physics Letters, Vol. 92, 013124, 2008

Litvinov, D., V. Parekh, C. E, D. Smith, J. Rantschler, D. Weller, and S. Khizroev, P. Ruchhoeft, "Nanoscale Bit-Patterned Media for Next Generation Data Storage Systems"Journal of Nanoelectronics and Optoelectronics, Vol. 3(2), 93-112, 2008.

Litvinov, D., V. Parekh, C. E, D. Smith, J. Rantschler, D. Weller, and S. Khizroev, P. Ruchhoeft, "Recording Physics, Design Considerations, and Fabrication of Nanoscale Bit-Patterned Media," IEEE Transactions on Nanotechnology, Vol. 7(4), 463-476, 2008.

Parekh, C. E, V., S. Khizroev, D. Litvinov, and P. Ruchhoeft, "Magnetization Reversal in Patterned, (Co/Pd)(n) Multilayers," Journal of Applied Physics, Vol. 103(6), 063904, 2008.

Parekh, V.A., A. Ruiz, P. Ruchhoeft, S. Brankovic, and D. Litvinov, "Close-Packed Noncircular Nanodevice Pattern Generation by Self-Limiting Ion-Mill Process," Nano Letters, 7(10), 3246-3248, 2007.

Litvinov, D., Ch. E, V. Parekh, D. Smith, J. Rantschler, S. Zhang, W. Donner, T.R. Lee, P. Ruchhoeft, D.Weller, and S. Khizroev, "Design and Fabrication of High Anisotropy Nanoscale Bit-Patterned Magnetic Recording Medium for Data Storage Applications," The Electrochemical Society, 3(25), 249-258, 2007 (invited).

V. Parekh, A. Ruiz, P. Ruchhoeft, S. Brankovic, and D. Litvinov, "Close-Packed Noncircular Nanodevice Pattern Generation by Self-Limiting Ion-Mill Process," Nano Letters (2007).

V. Parekh, E. Chunsheng , D. Smith, A. Ruiz, J. C. Wolfe, P. Ruchhoeft, E. Svedberg, S. Khizroev and D. Litvinov, "Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications," Nanotechnology, 17, pp.2079-2082 (2006).

E. Qiang, J. Chen, T. Zhao, K. Han, A. Ruiz, P. Ruchhoeft, M. Morgan, "Effects of manufacturing artifacts on infrared filter performance," Microwave and Optical Technology Letters, 48(9), pp.1749-1754, (2006).

V. Zomorrodian, B. Craver, G. Radhakrishnan, M. Patel, E. J. Charlson, P. Ruchhoeft, J. C. Wolfe, "Threshold voltage adjustment on spherical, single-crystal silicon substrates by focused ion beam implantation," J. Vac. Sci. Technol. B, 24(6), pp.3221-3226 (2006).

V. Parekh, A. Ruiz, P. Ruchhoeft, H. Nounu, D. Litvinov, J. C. Wolfe, "Estimation of scattered particle exposure in ion beam aperture array lithography," J. Vac. Sci. Technol. B, 24(6), pp.2915-2919 (2006).

K. Han, W. Xu, A. Ruiz, P. Ruchhoeft, and S. Chellam, "Fabrication and Characterization of Polymeric Microfiltration Membranes using Aperture Array Lithography," Journal of Membrane Science, Vol. 249, No. 1-2, pp.193-206, 2005.

S. Wang, J. Chen and P. Ruchhoeft, "An ADI-FDTD Method for Periodic Structures," IEEE Transactions on Antennas and Propagation, Vol. 53, No. 7, pp. 2343-2346, 2005.

R. Qiang, J. Chen, T. Zhao, S. Wang, P. Ruchhoeft, and M. Morgan, "Modeling of Infrared Bandpass Filters using a Three-dimensional FDTD Method," Electronics Letters, Vol. 41, No. 16, pp. 914-915, 2005.

L. Xu, D.J. Economou, V.M. Donnelly, and P. Ruchhoeft, "Extraction of a Nearly Monoenergetic Ion Beam using a Pulsed Plasma," Applied Physics Letters, Vol. 87, p. 041502, 2005.

P. Ruchhoeft, J. C. Wolfe, and R. Bass, "Ion beam aperture-array lithography," J. Vac. Sci. Technol. B, 19(6), (2001).

P. Ruchhoeft and J. C. Wolfe, "Determination of resist exposure parameters in helium ion beam lithography: absorbed energy gradient, contrast, and critical dose," J. Vac. Sci. Technol. B, 18(6), 3177 (2000).

P. Ruchhoeft and J. C. Wolfe, "An Optimal Strategy for Controlling Linewidth on Spherical Focal Surface Arrays," J. Vac. Sci. Technol. B, 18(6) 3185 (2000).

R. Kaesmaier, H. Löschner, G. Stengl, J. C. Wolfe, and P. Ruchhoeft, "Ion projection lithography: international development program," J. Vac. Sci. Technol. B, 17(6), 3091 (1999).

P. Ruchhoeft, J. C. Wolfe, J. Wasson, J. Torres, H. Wu, H. Nounu, N. Liu, M. Herbordt, M. D. Morgan, and R. C. Tiberio, "Fabrication of silicon stencil masks with vitreous carbon ion-absorbing coatings," J. Vac. Sci. Technol. B, 16(6), 3599 (1998).